Product Overview

The ZYGO ZMI-2002 8020-0211-1-J is a high-precision displacement measuring interferometer module designed for advanced position sensing in semiconductor, optics, and precision manufacturing industries. Developed by ZYGO, a global leader in metrology solutions, this unit delivers ultra-accurate linear and angular displacement measurements, enabling precise control of motion systems.

Engineered for demanding applications such as lithography stages, coordinate measurement machines, and precision machining equipment, the ZYGO ZMI-2002 8020-0211-1-J offers nanometer-level resolution with exceptional stability. Its interferometric measurement technology ensures outstanding repeatability and accuracy, making it ideal for process-critical environments where precision and reliability cannot be compromised.

This model integrates seamlessly into multi-axis measurement setups, providing real-time data for motion feedback and system control. The ZYGO ZMI-2002 8020-0211-1-J is designed to operate reliably under controlled laboratory and industrial conditions, offering long-term performance stability for high-value manufacturing processes.

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Technical Specifications

Key Features and Benefits

The ZYGO ZMI-2002 8020-0211-1-J provides unmatched precision in displacement measurement, a critical factor for industries where even the smallest positioning error can compromise production quality. With nanometer-level resolution, it ensures that motion systems operate within exact tolerances, supporting both high-accuracy positioning and repeatability.

The core strength of this interferometer module lies in its optical measurement technology. Unlike traditional position sensors, interferometric measurement is immune to mechanical wear and drift, providing long-term accuracy and reliability. This makes the ZMI-2002 8020-0211-1-J a highly dependable solution for continuous-use applications.

System integration is another key advantage. The ZMI-2002 8020-0211-1-J is designed to work seamlessly in multi-axis systems, supporting real-time feedback loops that enhance motion control and improve system performance. Its compact design also allows flexible installation in space-limited setups, while maintaining stability and signal integrity.

In semiconductor lithography, precision machining, and optical component testing, the ZMI-2002 8020-0211-1-J enables manufacturers to achieve higher yields, lower scrap rates, and improved process efficiency. With its advanced measurement capabilities, it plays a critical role in maintaining the accuracy and quality standards required by leading-edge industries.

Related Models

• ZMI-2001 – Previous-generation interferometer with basic displacement measurement functionality.

• ZMI-2004 – Multi-axis version designed for simultaneous measurement of several degrees of freedom.

• ZMI-4104 – Advanced model offering higher resolution and enhanced environmental compensation.

• ZMI-2002 8020-0212-1-J – Variant with extended performance specifications for specialized applications.

• ZMI-2400 – High-end interferometer designed for semiconductor lithography stage systems.

• ZMI-1010 – Compact version optimized for laboratory and R&D applications.

• ZMI-4020 – Enhanced precision system with upgraded electronics for ultra-stable operation.